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MD-2300 Batch-type Wafer Plasma Photoresist Stripper Completed installation and commissioning in Europe.
20 Sep 2026

MD-2300 Batch-type Wafer Plasma Photoresist Stripper Completed installation and commissioning in Europe.

Wafer Stripper/ Wafer Stripping System /Photoresist Stripper / Wafer Photoresist Stripper /Wafer Ashing System /Wafer Ashing Equipment

MDXN-G33D8 Mask Aligner Customer Acceptance Site
26 Jan 2026

MDXN-G33D8 Mask Aligner Customer Acceptance Site

This device is highly suitable for use in university chip laboratories. We provide you with one-stop professional solution for semiconductor fabrication and various chips package equipments sulotion from China. The process engineer and electrical engineer from the user side have completed the acceptance inspection of the Mask Aligner -MDXN-G33D8 equipment.

Etching: One of the 3 core Equipment in Semiconductor Manufacturing
28 May 2025

Etching: One of the 3 core Equipment in Semiconductor Manufacturing

Semiconductor Manufacturing / Plasma Etching / Reactive Ion Etching

The Detection Solution of Ellipsometer in IC Integrated Circuit Industry
15 May 2025

The Detection Solution of Ellipsometer in IC Integrated Circuit Industry

IC design, also known as integrated circuit design, has high precision in nano process technology, and the higher the accuracy, the more advanced the production process. When more transistors are integrated into the processor, the chip can achieve mo...

2D Material Etching / 2D Material Patterning
22 Apr 2025

2D Material Etching / 2D Material Patterning

Low dimensional material etching refers to the process of etching two-dimensional materials (such as graphene, molybdenum disulfide, etc.) and one-dimensional materials (such as nanowires, nanotubes, etc.). The purpose of low dimensional material etc...

What is the use of the rapid annealing furnace in the wafer manufacturing process?
06 Mar 2025

What is the use of the rapid annealing furnace in the wafer manufacturing process?

The rapid annealing furnace uses halogen infrared lamp as the heat source to heat the material to the required temperature through rapid heating, so as to improve the crystal structure and optoelectronic properties of the material. Its features inc...

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