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  • ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine
  • ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine
  • ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine
  • ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine
  • ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine
  • ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine
  • ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine
  • ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine
  • ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine
  • ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine
  • ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine
  • ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine

ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine

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Product Description

ICP Dry Plasma Photoresist Removal Machine

ICP dry plasma photoresist removal machine is mainly used for removing polymers, ASHING, DESCUM, photoresist removal after ion implantation, and surface residue removal. The cavity is suitable for 4-8 inch samples, with 1-2 pieces processed in a single process.
ASHING
Polymer removal
Dry removal of hard mask layer
Photoresistance removal after ion implantation
Photoresistance removal in BAW/SAW process
Dry cleaning of anti reflective graphic film layer
Surface residue removal
Surface cleaning after etching
DESCUM
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine details
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine details
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine details
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine factory
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine details
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine details
Specification
PLASMA
RF
RF
Power
ICP
1000w
1000w
BIAS
600w(option)
600w(option)
Applicable scope
4~8寸
4~8寸
Single processing slice count
1
2
Appearance dimensions
1080x1840x1800mm
1340x2050x1800mm
System control
Industrial control system
Industrial control system
Automation level
automatic
automatic
Factory
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine details
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine factory
Product details
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine details
Packing & Delivery
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine details
Company Profile
16 years of experience in equipment export！ We can provide you with a one-stop Semiconductor Front End Processes and Equipment solution!
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine supplier
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine manufacture
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine details
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine factory
ASKING DESCUM photoresist removal ICP Dry Plasma Photoresist Removal Machine factory

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