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Introduction: This equipment is mainly composed of a stainless steel vacuum chamber, a magnetron sputtering target, an evaporation coating device, a sample table for placing samples, a vacuum pump unit, a vacuum measurement gauge, an air intake system and a control system. The main unit of the equipment is operated by a touch screen and detected by a temperature control meter. Its digital parameter interface and automated operation provide users with an excellent R&D platform. The vacuum chamber adopts a bottom target design, and the sample table has heating and rotation functions, which can make the coating effect more uniform. The vacuum acquisition system of the equipment adopts a two-stage vacuum pump group. The front stage pump is a high-speed mechanical pump, which effectively shortens the time from normal pressure to low vacuum. The main pump is a turbo molecular pump with a high pumping speed and faster vacuum acquisition speed. The overall vacuum acquisition system is clean and fast.
Application: It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
