Highlight
Introduction: This equipment is a dual-target magnetron coating instrument. It is equipped with two magnetron targets and two sets of DC power supplies. It can be used to coat multi-layer conductive metal films. At the same time, the equipment consists of two parts: the main chamber and the transition chamber. The transition chamber is equipped with a magnetic push rod, and a vacuum gate valve is installed between the two chambers. The user can load samples in the transition chamber and pre-vacuum while sputtering in the main chamber. After the sputtering of the main chamber is completed, the sample can be pushed into the sample stage of the main chamber through the magnetic push rod. This design can reduce the number of times the main chamber is evacuated and released, which can not only effectively save time, but also ensure better local vacuum and effectively improve the coating quality.
Application: It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.