



|  Model |  MDAM-CMP100 |  MDAM-CMP150 | |
|  Wafer size |  4 inches and below |  6 inches and below | |
|  Working plate diameter |  420mm |  420mm | |
|  Station |  ≤4 |  ≤2 | |
|  Feed port |  ≤3 | ||
|  Power supply |  220V、10A | ||
|  Timing |  0-10h | ||
|  Ambient temperature |  20℃~35℃ | ||
|  Plate speed |  0-120rpm | ||
|  Fixture rate |  0-120rpm | ||
|  Sample fixing system component |  Clamp, roller arm | 
|  Lapping process assembly |  Lapping plate, plate repairing block, and cylinder | 
|  Polishing process assembly |  Polishing fluid feeding system and polishing plate | 
|  Detection component |  Test benchmark platform,flatness tester,pressure test gauge | 
|  Wafer lapping and polishing material package |  Lapping powder,polishing solution,polishing cloth,wax, dewaxing fluid,glass substrate sheet | 








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