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Introduction: The dual-target magnetron sputtering coating instrument is a laboratory-specific coating instrument with two target positions developed by our company. The equipment is equipped with a DC power supply and a radio frequency power supply. Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and high speed, high coating rate, and is a typical high-speed low-temperature sputtering. The magnetron target is equipped with a water-cooled inter layer. The water cooler can effectively take away the heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time. The sample stage of this model adopts a reciprocating design, with a magnetic coupling push rod on the left side, which can push the sample stage left and right. The whole machine is controlled by a touch screen, with a built-in one-button coating program, simple and easy to operate, and is an ideal equipment for laboratory preparation of thin films.
Application: It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
