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Introduction: The magnetron sputtering coating instrument is a cost-effective magnetron sputtering coating equipment independently developed by our company, which has the characteristics of standardization, modularization and customization. The magnetron targets are available in 1 inch, 2 inches and 3 inches, and customers can choose according to the size of the substrate to be plated; the power supply is a 500W high-power DC power supply, which can be used for high-energy metal sputtering coating. According to experimental requirements, other specifications of DC or RF power supplies can also be selected to realize the coating operation of various materials.
Application: It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.