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  • Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine
  • Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine
  • Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine
  • Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine
  • Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine
  • Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine
  • Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine
  • Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine
  • Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine
  • Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine
  • Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine
  • Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine

Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine

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Product Description

RIE Plasma photoresist removal machine

RIE Plasma photoresist removal machine suitable for silicon carbide etching, surface residue removal, silicon oxide or silicon nitride etching, etc. The cavity is suitable for 4-8 inch samples
Silicon carbide etching
Surface cleaning after etching
DESCUM
Hard mask layer, dry removal
Silicon oxide or silicon nitride etching
Removal of optical resistance between media
Surface residue removal
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine factory
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine supplier
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine factory
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine factory
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine factory
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine factory
Specification
PLASMA source
RF
Power
ICP
_
BIAS
1000W(option)
Applicable scope
4~8 inch
Single processing slice count
1
Appearance dimensions
850mmx900mmx1850mm
System control
PLC
Automation level
Manual
Factory
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine factory
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine details
Packing & Delivery
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine details
Company Profile
16 years of experience in equipment export！ We can provide you with a one-stop Semiconductor Front End Processes and Equipment solution!
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine details
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine manufacture
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine supplier
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine supplier
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine manufacture

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