structure |
illustrate |
Exposing the countertop |
Exposure area: countertop, substrate placement area |
Optical system |
Laser emission molding area |
Environmental control system |
Control the internal temperature and positive pressure of the device |
Platform system |
Controls the movement of the exposure table to complete the operation of the exposure path |
Control system |
Control system of the entire equipment |
No. |
Environment |
Require |
1 |
Light source environment |
Yellow light |
2 |
Temperature |
22℃±2℃ |
3 |
Humidity |
50%±10% |
4 |
Cleanliness |
1000 |
5 |
CDA |
0.6±0.1Mpa，200LPM, dry, clean air |
6 |
Power supply |
220~240V、50/60Hz、2.5KW；The ground wire must be grounded， |
7 |
Cooling water |
Temp.：10℃~ 20℃ Pressure：0.3MPa ~ 0.5MPa Flow rate：20L/min Pressure difference：0.3MPa以上 Take over caliber：Rc3/8 |
8 |
Venue |
level：±3mm/3000mm shake：VC-B Bearing：750kg/㎡ |
10 |
Internet |
One network port |
11 |
Machine size |
1300*1100*2100mm |
12 |
Device weight |
1500kg |
No. |
Project |
Spec. |
Remark |
1 |
Resolution |
0.6um/or other requirement |
AZ703、AZ1350 |
2 |
CDU |
±10%@1um |
|
3 |
Substrate thickness |
0.2mm～4mm |
|
4 |
Date grid accuracy |
60nm |
|
5 |
Overlay |
±500nm |
130mmx130mm |
6 |
Stitching accuracy |
±200nm |
AZ703 |
7 |
MAX exposure size |
190X190mm |
|
8 |
Throughput |
≥300mm2/min |
≤50mj/cm2； |
9 |
light source |
LD 375nm |
|
10 |
light power |
6W |
|
11 |
Energy uniformity |
≥95% |
|
12 |
light life |
10000hr |
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