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Guangzhou Minder-Hightech Co.,Ltd.
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  • Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine
  • Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine
  • Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine
  • Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine
  • Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine
  • Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine
  • Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine
  • Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine
  • Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine
  • Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine
  • Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine
  • Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine

Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine

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Product Description

ICP Experimental Plasma Photoresist Removal Machine

Polymer removal, silicon oxide or silicon carbide etching, surface cleaning after etching
ASHING Polymer removal DESCUM Dry removal of hard mask layer Photoresistance removal after ion implantation Removal of optical resistance between media Photoresistance removal in BAW/SAW process Dry cleaning of anti reflective graphic film layer Silicon oxide or silicon nitride etching Surface residue removal Surface cleaning after etching Silicon carbide etching
Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine supplier
Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine factory
Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine details
Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine manufacture
Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine factory
Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine factory
Specification
PLASMA source
RF+BIAS
Power
1000W
1000W
600W
600W
Applicable scope
4-8 inches
Single processing slice count
one
Appearance dimensions
1140mm x 1050mm x 1620mm
System control
Industrial control system
Automation level
Manual
Factory
Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine supplier
Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine manufacture
Packing & Delivery
Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine supplier
Company Profile
16 years of experience in equipment export！ We can provide you with a one-stop Semiconductor Front End Processes and Equipment solution!
Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine supplier
Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine details
Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine details
Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine supplier
Clean Semiconductor Wafer after Etching ICP Experimental Plasma Removing Photoresist Machine factory

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