
UV light source center wavelength |
405nm |
Exposure uniformity |
More than 90% |
Minimum feature linewidth |
0.5um |
Single-pass writing field exposure area |
0.16*0.16mm (@0.5um) |
Writing speed |
80 mm²/min (1um feature line width) |
Supported image formats |
DXF, GDS, bmp, png, etc. |
Configuration |
Basic version |
Professional version |
|
Light source |
High-power LED: 405nm |
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DMD chip |
DLP6500 |
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Single-field exposure area |
0.16*0.16mm (@0.5um), 0.4*0.4mm (@0.7um), 0.8*0.8mm (@1um), 1.6*1.6mm (@2um) |
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Camera |
Large-area microscope camera (supports size measurement) |
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Minimum equidistant line width |
0.8 µm |
0.5μm |
|
Stitching accuracy |
±0.3 µm |
±0.3μm |
|
Overlay accuracy |
±0.5 µm |
±0.5μm |
|
Writing speed |
20 mm²/min (1 µm feature linewidth) |
80 mm²/min (1μm feature linewidth) |
|
Motion stage |
High-precision linear motor (repeatable positioning accuracy ±0.25µm), leveling mechanism, manual rotary stage |
High-precision linear motor (repeatable positioning accuracy ±0.25µm), leveling mechanism, electric rotary stage |
|
Objective lens changer |
Manual objective lens switching |
Motorized objective lens switching |
|
Focusing module |
CCD image autofocus |
Laser active focusing |
|
Supported wafer sizes |
4 inch |
4-inch/8-inch |
|
Sample thickness |
0-10mm |
0-10 mm |
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