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Introduction:
The dual-target magnetron sputtering coater is a laboratory-specific coater developed by our company. The equipment can be equipped with a DC power supply and an RF power supply, with power ranging from 500W to 1000W. Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and high speed, high coating rate, and low sample temperature rise. It is a typical high-speed and low-temperature sputtering. The magnetron target is equipped with a water-cooled inter layer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time. The equipment has been compactly designed to achieve a balance between volume and performance, with beautiful appearance and comprehensive functions. The whole machine is controlled by a touch screen, with a built-in one-button coating program, which is simple and easy to operate. It is an ideal equipment for preparing thin films in the laboratory.
Application: It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.