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  • Wafer Semikonduktor Etching Karbida Silikon RIE Etching Ion Reaktif Plasma Mesin Penghilangan Photoresist
  • Wafer Semikonduktor Etching Karbida Silikon RIE Etching Ion Reaktif Plasma Mesin Penghilangan Photoresist
  • Wafer Semikonduktor Etching Karbida Silikon RIE Etching Ion Reaktif Plasma Mesin Penghilangan Photoresist
  • Wafer Semikonduktor Etching Karbida Silikon RIE Etching Ion Reaktif Plasma Mesin Penghilangan Photoresist
  • Wafer Semikonduktor Etching Karbida Silikon RIE Etching Ion Reaktif Plasma Mesin Penghilangan Photoresist
  • Wafer Semikonduktor Etching Karbida Silikon RIE Etching Ion Reaktif Plasma Mesin Penghilangan Photoresist
  • Wafer Semikonduktor Etching Karbida Silikon RIE Etching Ion Reaktif Plasma Mesin Penghilangan Photoresist
  • Wafer Semikonduktor Etching Karbida Silikon RIE Etching Ion Reaktif Plasma Mesin Penghilangan Photoresist
  • Wafer Semikonduktor Etching Karbida Silikon RIE Etching Ion Reaktif Plasma Mesin Penghilangan Photoresist
  • Wafer Semikonduktor Etching Karbida Silikon RIE Etching Ion Reaktif Plasma Mesin Penghilangan Photoresist
  • Wafer Semikonduktor Etching Karbida Silikon RIE Etching Ion Reaktif Plasma Mesin Penghilangan Photoresist
  • Wafer Semikonduktor Etching Karbida Silikon RIE Etching Ion Reaktif Plasma Mesin Penghilangan Photoresist

Wafer Semikonduktor Etching Karbida Silikon RIE Etching Ion Reaktif Plasma Mesin Penghilangan Photoresist

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Deskripsi Produk

Mesin penghapusan photoresist plasma RIE

Mesin penghapusan photoresist plasma RIE cocok untuk etching karbida silikon, penghapusan residu permukaan, etching oksida silikon atau nitrida silikon, dll. Ruang vakum cocok untuk sampel berukuran 4-8 inci
Etching karbida silikon
Pembersihan permukaan setelah etching
DESCUM
Lapisan hard mask, penghapusan kering
Etching oksida silikon atau nitrida silikon
Penghilangan hambatan optik antar media
Pembersihan sisa permukaan
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine factory
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine supplier
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine factory
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine factory
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine factory
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine factory
Spesifikasi
Sumber plasma
RF
Daya
ICP
_
BIAS
1000W(opsi)
Ruangan Penerapan
4~8 inci
Jumlah irisan pengolahan tunggal
1
Dimensi penampilan
850mmx900mmx1850mm
Kontrol sistem
PLC
Tingkat Otomatisasi
Manual
Pabrik
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine factory
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine details
Packing & Pengiriman
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine details
Profil Perusahaan
16 tahun pengalaman dalam ekspor peralatan! Kami dapat menyediakan solusi satu atap untuk Proses dan Peralatan Front End Semikonduktor bagi Anda!
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine details
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine manufacture
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine supplier
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine supplier
Semicondctor wafer Silicon carbide etching RIE Reactive Ion Etching Plasma Photoresist Removal Machine manufacture

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